Industrial Vacuum Plasma Processing Unit (Plasma DEJ)

Industrial Vacuum Plasma Processing Unit (Plasma DEJ)

  • Basa Fan Avarane Nasir
  • Surface plasma processing

    1. Certificate of Nanotechnology

    2. 2019/05/05
    3. 2022/05/06

    1. NanoScale Certification

    2. 2019/05/05
    3. 2022/05/06
Introduction Application Specification Advantage Of Using Nanotechnology Manual And Maintenance Safety And Package

Industrial Vacuum Plasma Processing System is a device used for surface activation, surface cleaning, and deposition of a thin polymer layer with desired properties on different surfaces. Plasma processing by using this device is conducted in a controlled environment inside a sealed chamber, which is maintained at a medium vacuum through the introduction of selected gases. To do this, the surface is first cleaned and activated by the gas or mixture of gases which ionized by a radio frequency (RF) generator. Depending on the desired properties, then an appropriate monomer gas or liquid is pumped into the chamber where it is polymerized by a plasma to form a thin coating. The monomer is ionized by plasma excitation and its molecules break apart creating free electrons, ions, exited molecules and radicals. The radicals adsorb, condense, and polymerize on the surface. The electrons and ions crosslink, or create a chemical bond with the already deposited molecules, creating a harder and denser coating with a controllable thickness between 30 to 300 nm.

Some applications of this device are as follows:

  • Creating Hydrophilic and hydrophobic surfaces
  • Surface cleaning
  • Surface activation
  • Adhesion Promotion
  • Creating anti-stain properties
  • Wettability improvement

Details of technical specifications are presented in the following Table.

 

Plasma technology can be used for nano-scale surface processing which includes creation of surfaces with nanometric roughnesses, or deposition of layers in the nanometer range for achieving new functionalities.

  • Before turning on the system, make sure that the plasma chamber is clean and free from any contaminants.
  • Never touch the door, inside the chamber and its components with a dirty and greasy hand.
  • Use disposable plastic gloves to put the sample inside the chamber.
  • Device should be installed in a place with an area of at least 30 square meter, a height of 3.5 meter, and appropriate ventilation.
  • For more details on how to use the device, refer to the device catalog and user guide.
  • Device should not be at the exposure of sunlight or other heat sources.
  • Keep the device away from the moisture and excessive heat, or devices that create strong magnetic or electric fields.
  • To transfer the rack to the company for repairing or equipping, package it properly to avoid damaging the device.
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